| abstract |
(57) Abstract: A phenol derivative having a weight average molecular weight of 50 comprising a den polymer or a hyperbranched polymer. 0 to 10,000,000 high molecular compounds. The novel polymer compound of the present invention, such as a denpolymer and a hyperbranched polymer, is fundamentally different from a normal linear polymer compound. For example, when the novel polymer compound is used as a base resin of a resist material However, the size of the polymer is proportional to the resolution, and when the size is reduced, there is a disadvantage that the strength of the linear polymer compound is insufficient, but this new polymer compound can change the size of the polymer arbitrarily. The new polymer compound has a feature that the size can be reduced while maintaining strength. Therefore, a resist material excellent in high resolution, sensitivity, and plasma etching resistance, which is not available in conventional resist materials, is provided. |