http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000305273-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 1999-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a59bfee7f69bb6a21633945987e8648 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_67d289e23ce687c476be7cb04273d2bd |
| publicationDate | 2000-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2000305273-A |
| titleOfInvention | Deep UV dry photolithography |
| abstract | (57) [Summary] (With correction) [Solution] A dry photolithography process of an organosilane plasma polymer. Forming a high-density deep-ultraviolet photoresist layer with trimethylsilane and other organosilane precursors, and the contrast of the photoresist layer is selected by the oxygen content of the developing plasma. The deep ultraviolet dry photolithography process, wherein the plasma polymer layer is stable in air before and after the exposure in photolithography. [Effect] Realization of a dry photolithography process having good edge appearance and high contrast when forming a line spacing of 0.13 μm or less. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200095542-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007503728-A |
| priorityDate | 1998-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 45.