| abstract |
(57) Abstract: A resist film applied on an inorganic substrate, a resist remaining after etching, and a resist residue can be easily peeled off in a short time. At that time, various semiconductor layer materials, wiring materials, insulating films, etc. A resist stripping solution that does not corrode at all, and does not require the use of an organic solvent such as alcohol as a rinsing solution, and can be rinsed only with water. SOLUTION: (a) an oxidizing agent, (b) a chelating agent, (c) A resist stripper comprising an aqueous solution containing a water-soluble fluorine compound and, if necessary, (d) an organic solvent, and a method of stripping a resist using the stripper. |