| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_294881271413951a95f284b588a68e66 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
| filingDate |
1998-11-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66de07361cc7a89e05452f8e3477789b |
| publicationDate |
2000-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2000150481-A |
| titleOfInvention |
Etching apparatus and method of manufacturing semiconductor device using the same |
| abstract |
(57) [PROBLEMS] To provide an etching apparatus capable of preventing a deposit of a reaction product by etching from adhering to a side wall of a reaction chamber. SOLUTION: A reaction chamber 1 accommodating an etching object 5 is provided. The heating device 30 for heating the side wall 32 of the reaction chamber 1 is provided in the etching apparatus 11 provided with |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007529895-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002025987-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106711006-A |
| priorityDate |
1998-11-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |