http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000143213-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_00823c653968e3a68b83716db4a4e010 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B7-19 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 1998-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d7fcc1f0ff93d78e2770ed1a614d73c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_998a101b4c3a815eb454bf8f68ae0c95 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_186408dce672bb2b525a170073231576 |
| publicationDate | 2000-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2000143213-A |
| titleOfInvention | Supply method of semiconductor processing gas |
| abstract | (57) [Problem] To provide a semiconductor processing gas supply method capable of suppressing corrosion of equipment and piping in a gas supply system or a semiconductor manufacturing facility by generating hydrogen fluoride and moisture at a processing location. I do. SOLUTION: A fluorine-containing gas such as fluorine, chlorine fluoride, bromine fluoride, iodine fluoride and a substance having hydrogen and oxygen atoms such as hydrogen peroxide, water, alcohols and the like are used for semiconductor manufacturing equipment. Are supplied individually to the processing section, and hydrogen fluoride and moisture are generated in the processing section. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7201807-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009213946-A |
| priorityDate | 1998-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 44.