abstract |
(57) Abstract: The present invention relates to a shelf life. And a novel photoresist composition having significantly improved lithographic properties. SOLUTION: The present invention provides a solvent having no hydroxy group (for example, a non-hydroxylic solvent), a resin binder, and a sulfonium photoacid generator compound having sufficient solubility in the solvent (photoacid generator). A photoresist composition comprising r compound (PAG). These resists have very good storage stability. For example, even after being stored for a long period of time, the photospeed d) hardly changes. |