abstract |
(57) [Problem] To provide a positive resist composition which has excellent residual film ratio and resist profile with respect to deep ultraviolet rays, particularly ArF excimer laser light, and which does not cause problems of development defects. SOLUTION: A compound generating an acid upon irradiation with actinic rays or radiation, a polycycloolefin resin having an alicyclic group and a carboxyl group in the main chain, a compound having at least two groups having a specific structure, and a molecule A positive resist composition containing therein a compound containing a nitrogen-containing basic group and an acidic group, and a fluorine-based and / or silicon-based surfactant. |