http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000068256-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f5dfbc3f20fded5e95a522d3f286729a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_284607f933f685523d71cb13e57dd17e
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
filingDate 1999-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_13996f23daa3b1787fa910f6c1a54f08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e7e021ffb8b8c3a9bc8e62d4ed441baa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_04a5e2f2ca84698904647101ed61d4b9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_797da4041d5d0305e247c0588b1d3b1c
publicationDate 2000-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2000068256-A
titleOfInvention Wafer etching method
abstract (57) [PROBLEMS] To suppress generation of white turbidity on a wafer surface during etching by adding hydrogen gas, ammonia gas, or a mixed gas containing any of these gases to sulfur hexafluoride gas. In addition, the present invention provides a wafer etching method which enables high-quality wafer mirror processing. SOLUTION: SF6 gas G1 of cylinder 31 and cylinder 3 A mixed gas obtained by mixing the H 2 gas G 2 with the H 2 gas at a predetermined ratio is supplied to the discharge tube 2, and the microwave M is supplied to the microwave oscillator 4. To oscillate and cause a plasma discharge. And the nozzle part 2 0 by locally etching the surface of the silicon wafer W with the active species gas G injected from 0. Flatten the entire surface.
priorityDate 1998-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID17358
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419527022
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425193155
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419550829
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID222
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID783

Total number of triples: 24.