| abstract |
(57) [Problem] To provide a dry processing apparatus capable of keeping transport means clean, preventing particles from adhering to the product when the product is transported, and maintaining the processing quality of the product. SOLUTION: A dummy arm 25 and a dust collecting plate 26 for collecting reaction products are provided on a transfer arm 23, and the dust collecting plate 26 is provided. Is maintained at a temperature lower than the temperature of the transfer arm 23 by the Peltier element cooler. After the etching process on the semiconductor substrate 36 is completed, an Ar gas is supplied into the process chamber 6 to exhaust the reaction product 43 to the outside of the process chamber 6, and then the dummy arm 25 and the dust collecting plate 26 are separated from the process chamber 6. 6. The reaction product 43 is collected by inserting the reaction product 43 into the inside of the device. |