| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b1007735376d07808ebe297f823b2829 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K2323-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K2323-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29L2031-3475 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13394
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1303
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-3857 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1339
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C33-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C43-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 |
| filingDate |
2007-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d289ca70f5c379dcd8580531f1b1438
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db4054cc58f2ff6f96d7feca06bb5223 |
| publicationDate |
2008-01-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
GB-2439639-A |
| titleOfInvention |
Resist for soft mold and method for fabricating liquid crystal display using the same |
| abstract |
A soft mold resist for soft-lithography and a method for fabricating a liquid crystal display (LCD) device using the same where the soft mold includes a hydrophilic liquid prepolymer, a photoinitiator and a surface active agent, are provided. A soft mold (207a) is formed by applying the soft mold resist (205a) to a back plate (201) or a master plate and transferring a predefined pattern (B) from the master plate to the soft mold resist. A display is formed by applying the soft mold to an etch resist layer overlying a thin film and transferring the predefined pattern to the etch resist, then etching the thin film using the etch resist as a mask. Additional processing steps are carried out to form the LCD device. |
| priorityDate |
2006-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |