| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D3-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02024 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
| filingDate |
2005-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5d64040c6ecced0ead65580d9505ec5 |
| publicationDate |
2006-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
GB-2419134-A |
| titleOfInvention |
Polishing composition and polishing method |
| abstract |
A polishing composition comprises an abrasive, water and at least one compound selected from the group consisting of azoles and derivative thereof. The polishing composition may further include a polishing accelerator, a chelating agent and/or a water soluble polymer. The azole compound is preferably an imidazole or triazole. The polishing composition is used in applications for polishing surfaces of semiconductor surfaces. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7597729-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102477261-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2420122-B |
| priorityDate |
2004-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |