http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2241710-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3903f3f7af75b538a3346b1b315c5a5d
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3426
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3407
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34
filingDate 1991-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eee6abf442c82486c041ff1bbe57072d
publicationDate 1991-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber GB-2241710-A
titleOfInvention Magnetron sputtering of magnetic materials in which magnets are unbalanced
abstract A magnetron for sputtering of magnetic materials has a ferromagnetic core with an unbalanced arrangement of magnets providing a plasma entrapping field over the target. In an unbalanced magnetron the magnets of one polarity are not balanced by magnets of the opposite polarity of an equal total strength. The unbalanced arrangement enables the ferromagnetic target to be used without any artificial non-uniformity being introduced into the target to provide the field lines above it. In an unbalanced magnetron some lines of force tend to travel outside the target disc above its surface, in contradistinction to a balanced magnetron where the lines of force tend to travel within the target disc when it is of magnetic material, and thus are useful to effect the plasma (Fig. 4). <IMAGE>
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7115194-B2
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6790323-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011060748-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-19827587-A1
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priorityDate 1990-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 23.