| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fa1b9ebfcd0a9eea7ab4f03b347cfb5c |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02071
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 |
| filingDate |
1979-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
1980-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
GB-2026397-A |
| titleOfInvention |
Process for gas plasma vapour etching of aluminium surfaces |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1831429-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-3140675-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006068971-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0195477-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0195477-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7459100-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1831429-A2 |
| priorityDate |
1978-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |