http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-1295285-A

Outgoing Links

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34
filingDate 1969-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 1972-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber GB-1295285-A
abstract 1295285 Coating by sputtering NATIONAL RESEARCH DEVELOPMENT CORP 21 April 1970 [25 April 1969] 21218/69 Heading C7F An R. F. sputtering apparatus has an electrode on the outside of the chamber and material e.g. silica, glass alumina, other oxides or nitrides or p.t.f.e. is sputtered from at least part of the wall of the chamber. In Fig. 1, silica is deposited from a silica plate 7 forming the top of the chamber on to a substrate 15 by applying R. F. to a water cooled electrode 11. Alternatively, the plate may be of metal Fig. 2 (not shown) and a condensor is placed in the R. F. circuit. In a modification an annular electrode is positioned around a silica tube Fig. 3 (not shown) and the substrate may be a wire continuously wound in the tube Fig. 4 (not shown).
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2243844-A
priorityDate 1969-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 15.