| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32642 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683 |
| filingDate |
2010-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b2daf024f2cb40cd864cedcac93112b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a6ba3b0bbd720ed84adf50ed36a9067
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d138ce90f66cfe8703cafe59c69e4f78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d2e87804956cc6dcef1826c1114bf85 |
| publicationDate |
2011-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
FR-2953327-A1 |
| titleOfInvention |
DASHBOARD ASSEMBLY FOR PLASMA ENGRAVING CHAMBERS |
| abstract |
An edge ring of a plasma etch chamber (100) has a dielectric coupling ring and a conductive edge ring. The dielectric ring has an annular protuberance extending from its inner periphery and surrounds a substrate support (150). The conductive ring surrounds the protuberance of the dielectric ring. A substrate placed on the support (150) overhangs it and is superimposed on the protuberance of the dielectric ring and the conductive ring. The dielectric ring may have a rectangular section. The dielectric and conductive rings surround a support. A substrate placed on the support (150) overhangs it and is superimposed on a portion of the conductive ring. |
| priorityDate |
2009-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |