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publicationDate 2000-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber FR-2782839-A1
titleOfInvention METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE
abstract A method of manufacturing a semiconductor device comprises the steps (A) of forming a concave portion (14) in an insulating interlayer (13) formed on a substrate (11) such that part of the substrate is exposed in a bottom of the concave part, (B) forming a first electrically conductive layer (16) on the insulating inter-layer including in the interior of the concave part, by means of a process electroplating and (C) forming a second electrically conductive layer (17) on the first electrically conductive layer by means of an electroplating process, to fill the concave portion with the second electrically conductive layer.
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