| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate |
1995-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a46ef6eb458fb053605f74675bdfd2d0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a513aae4d7c7e2f3ee3339f596d1a51d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d18b0a314fb02124d0cca590368314d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d89c2e7749c9949c2e60ba396eba646
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3cfaeee220072790dc4ebaf686fd8b10 |
| publicationDate |
1995-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
FR-2716547-A1 |
| titleOfInvention |
Method for forming a resist pattern and for manufacturing a semiconductor device. |
| abstract |
The invention relates to a method for forming a resist pattern, characterized in that it comprises the steps of forming a resist layer (2b) by applying a resist to the surface of an element (1) which must being processed, the resist containing component A capable of expanding in volume by chemical reaction, exposing and developing the resist layer to form a pattern having an opening and chemically reacting a fluid containing component B with component A by fluid contact with component A to change the size of the opening (4b) of the resist layer, component B being capable of increasing the volume of component A by chemical reaction with component A. This method can be implemented implemented to manufacture a semiconductor device. |
| priorityDate |
1994-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |