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filingDate 1985-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 1987-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber FR-2591509-A1
titleOfInvention ANTI-POLLUTION DEVICE FOR THE REMOVAL OF TOXIC GASES IN THE PRODUCTION OF GROUP III-V SEMICONDUCTOR MATERIALS.
abstract Antipollution device for the elimination of toxic gases used in the production of group III-V semiconductor materials. Antipollution device for the elimination of toxic gases used in the production of group III-V semiconductor materials, these toxic gases typically being arsine and / or phosphine in a hydrogen atmosphere, whether or not associated with traces of chlorine, gallium, indium and / or aluminum, characterized in that it is formed by a combustion chamber the outer walls of which are cooled, which receives through a first inlet the hydrogen with which the gases are mixed and products to be removed, and which receives gaseous oxygen through a second inlet, under a controlled pressure so that the combination of oxygen and hydrogen is different from the composition of the so-called "explosive" mixture, in that that the hydrogen forms in the oxygen a so-called "diffusion" flame supplied by ignition means and in which the products to be eliminated are burnt, in that the residues of this combustion which are in particular arsenious anhydride and / or phosphoric acid and in all case of water, are collected on an outlet provided with pressure regulating means and directed to storage means, and in that it further comprises safety control means. (CF DRAWING IN BOPI)
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