| abstract |
The present invention relates to a reactor (10) for depositing layers on a substrate (22) to be coated, the reactor (10) obtaining at least one layer of the deposit by sputtering a target (20) onto the substrate, the reactor (10) comprising: - a first source (14) able to emit electromagnetic waves, the first source (14) being able to excite the plasma (P) between the target (20) and the substrate (22), and - a second source (16) able to emit electromagnetic waves, the second source (16) being able to excite the target (20). |