| abstract |
A plasma deposition method in which a cover layer is deposited onto the internal walls of an empty plasma chamber by plasma deposition of a precursor mixture comprising (i) one or more hydrocarbon compounds of formula (A), or (ii) one or more C 1 -C 3 alkane, C 2 -C 3 alkene or C 2 -C 3 alkyne compounds: (Formula (A)) wherein: Z 1 represents C 1 -C 3 alkyl or C 2 -C 3 alkenyl; Z 2 represents hydrogen, C 1 -C 3 alkyl or C 2 -C 3 alkenyl; Z 3 represents hydrogen, C 1 -C 3 alkyl or C 2 -C 3 alkenyl; Z 4 represents hydrogen, C 1 -C 3 alkyl or C 2 -C 3 alkenyl; Z 5 represents hydrogen, C 1 -C 3 alkyl or C 2 -C 3 alkenyl; and Z 6 represents hydrogen, C 1 -C 3 alkyl or C 2 -C 3 alkenyl. |