http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3158579-A1

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filingDate 2015-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37855deb73873dae42ef478a16747d5b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_15e85d113062957ff373f3077a92a699
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publicationDate 2017-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-3158579-A1
titleOfInvention Chemistries for tsv/mems/power device etching
abstract Replacement chemistries for the cC4F8 passivation gas in the Bosch etch process and processes for using the same are disclosed. These chemistries have the formula CxHyFz, with 1≦x＜7, 1≦y≦13, and 1≦z≦13. The replacement chemistries may reduce RIE lag associated with deep silicon aperture etching.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11437244-B2
priorityDate 2014-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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