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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C17-389
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filingDate 2014-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7fd5035e89678525c959d0ec4f3508c0
publicationDate 2016-01-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-2966053-A1
titleOfInvention High-purity 2-fluorobutane
abstract The present invention is a high-purity 2-fluorobutane having a purity of 99.9 % by volume or more and a butene content of 1,000 ppm by volume or less, and a method for using the high-purity 2-fluorobutane as a dry etching gas. According to the present invention, a high-purity 2-fluorobutane that is suitable as a plasma reaction gas for semiconductors is provided.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3432347-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019055469-A1
priorityDate 2013-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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