| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1809
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1805 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-281
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-24 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-24 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2009-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3aa197a0faee499992f0da36115aa856
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5c5bd0a1d03685933a67bd0666edf50d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_68675c92dac1fc72c756bcab27ad2178
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d08bfbb914272a63018aee5ccc2bbb8 |
| publicationDate |
2009-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-2090598-A1 |
| titleOfInvention |
Polymer, resist composition, and patterning process |
| abstract |
A polymer obtained through copolymerization of a monomer having a hexafluoroalcohol pendant whose hydroxyl moiety has been protected and a monomer having an acid labile group is useful as an additive to a photoresist composition for immersion lithography. When processed by immersion lithography, the resist composition exhibits good water repellency and water slip and produces few development defects. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2189845-A3 |
| priorityDate |
2008-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |