| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-181
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-188
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-667
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-184
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-182 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-70341
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-70925
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-181
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-70983
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-667
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-72 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D1-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D1-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2006-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_022dd828ba016d1a6cf5f126c039007a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b9bd142784285954564fbd5330cba6d4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_def1e66f171cfd7af0ff3e3817c4e5da
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f755c300b2571521cc9151a64d85c60 |
| publicationDate |
2008-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1962327-A1 |
| titleOfInvention |
Washing liquid for photolithography, and method for washing exposure device using the same |
| abstract |
Problem: To provide a cleaning liquid for lithography and a cleaning method using it for photoexposure devices. In a process of liquid immersion lithography, the cleaning liquid may efficiently clean the photoexposure device site (especially optical lens member) contaminated with the component released from photoresist and remove the contaminant, and in addition, the waste treatment for the cleaning liquid is easy, the efficiency in substitution with the cleaning liquid for the medium for liquid immersion lithography is high, and the cleaning liquid does not detract from the throughput in semiconductor production. Means for Solution; A cleaning liquid for photolithography to be used for cleaning a photoexposure device in a process of liquid immersion lithography that comprises filling the space between the optical lens member of a photoexposure device and an object for photoexposure mounted on the wafer stage, with a medium for liquid immersion lithography, the cleaning liquid comprising (a) a surfactant. (b) a hydrocarbon solvent, and (c) water; and a cleaning method using it for photoexposure devices. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2391700-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9074169-B2 |
| priorityDate |
2005-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |