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filingDate 2004-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6841a93dcacdc2e46e9604b650956471
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publicationDate 2006-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-1717335-A1
titleOfInvention Sputtering target, optical information recording medium and process for producing the same
abstract A sputtering target formed from a material obtained by adding any one or both of Ta and Y elements to an In 2 O 3 -ZnO-SnO 2 compound oxide having SnO 2 as its primary component. The present invention relates to a thin film for an optical information recording medium (especially used as a protective film) that has stable film amorphous nature, realizes high deposition speed, is superior in adhesiveness and mechanical properties with the recording layer, has a high transmission factor, and is composed with a non-sulfide system, whereby the deterioration of the adjacent reflective layer and recording layer can be suppressed. The present invention also relates to a manufacturing method of such a thin film, and a sputtering target for use therein. Accordingly, in addition to improving the performance of the optical information recording medium, the productivity can also be considerably improved.
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