http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1700333-A4
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bf00c191feaa3731547ebb2a4f1e5d73 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-68 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 |
| filingDate | 2004-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_355914ed8a2fff0fa019e4aa9f2acb30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c18329a2e57507994259c3569012b75f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1b2ebc24702a66bcaf39ce1497d00ae4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29bc7388399573dd5e91c0a90151877e |
| publicationDate | 2008-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-1700333-A4 |
| titleOfInvention | METHOD AND DEVICE FOR A PREPARATION SEMICONDUCTOR DEVICE FOR MEASURING PLASMA DEVICES |
| abstract | A plasma equipment seasoning method and plasma equipment to which the seasoning method is applied. The seasoning method comprising the steps of measuring the ratio of optical emission intensity of silicon oxide (SiOx)-based chemical species to optical emission intensity of carbon fluoride compound (CFY)-based chemical species present in a process chamber of plasma equipment before operating the plasma equipment to perform a plasma process, determining whether the value of the measured optical emission intensity ratio is within a predetermined range of normal state or not, and, when reaction gas to be used in the plasma process is supplied into the process chamber based on the result of determination such that the value of the measured optical emission intensity ratio is within the predetermined range of normal state, seasoning the interior of the process chamber to change the ratio of components of the reaction gas, and thus, to change the optical emission intensity ratio. |
| priorityDate | 2003-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.