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filingDate 2004-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_043eff5e8b8e709530e03ffacfee66a1
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publicationDate 2006-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-1667215-A1
titleOfInvention Dry etching process and method for manufacturing magnetic memory device
abstract Provision of a process capable of preferably etching particularly PtMn used for a pin layer of an MRAM is an object: a dry etching method for performing dry etching on a layer including platinum and/or manganese by using pulse plasma and a production method of an MRAM, wherein the dry etching method is applied to processing of the pin layer. The MRAM is configured to have a memory portion comprising a magnetic memory element composed of tunnel magnetoresistive effect element formed by stacking a magnetic fixed layer having a fixed magnetization direction, a tunnel barrier layer and a magnetic layer capable of changing the magnetization direction.
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