| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S438-952 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D179-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate |
2004-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4bdbfd830f0d3f90ec805038d728041d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88ffbfc645e3d35010e8383a481a65f9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90a1d41ea9579762e33aa1fb98bdd9d7 |
| publicationDate |
2006-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1666972-A1 |
| titleOfInvention |
Polyamide acid-containing composition for forming antireflective film |
| abstract |
There is provided an anti-reflective coating forming composition for use in a lithography and for forming an anti-reflective coating that can be developed with an alkaline developer for photoresist, and a method for forming photoresist pattern by use of the anti-reflective coating forming composition. Concretely, the composition comprises a polyamic acid produced from a tetracarboxylic dianhydride compound and a diamine compound having at least one carboxyl group, a compound having at least two epoxy groups, and a solvent. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017196010-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101473270-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8445175-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101899098-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2042927-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11586109-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010043946-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010043946-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2042927-A1 |
| priorityDate |
2003-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |