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filingDate 2005-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b20532b3d741db4dbbdac416f58ae631
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publicationDate 2005-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-1598881-A2
titleOfInvention Method for removing a substance from a substrate using electron attachment
abstract A method for removing a substance from at least a portion of a substrate whichnmay be for example, a reactor or a semiconductor material, is disclosed herein. In onenaspect, there is provided a method comprising: providing a reactor having a surfacencoated with a substance; providing a first and second electrode in proximal to the reactornwherein the first and second electrode reside within a target area; passing a gas mixturencomprising a reactive gas into the target area; supplying energy to the first and/or thensecond electrodes to generate electrons within the target area wherein at least a portionnof the electrons attach to at least a portion of the reactive gas thereby forming annegatively charged cleaning gas; contacting the substance with the negatively chargedncleaning gas which reacts with the substance and forms a volatile product; and removingnthe volatile product from the reactor.
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priorityDate 2004-04-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 45.