| abstract |
Method of designing a system for thermal vapor deposition that includes a materialnto be deposited on a workpiece, an elongated container for containing the material,na heater for heating the material in the container to vaporize the material, thencontainer defining n apertures for emitting the vaporized material in an elongatednpattern in the elongated direction, that includes the steps of: calculating the totalnsource throughput Q per unit length at a deposition rate of interest; calculating theninternal pressure P of the source required to produce Q for the total aperturenconductance C A of the source; modeling the system as a ladder network ofnconductances, the elongated container having a container conductance C B andnconductances C b = nC B , between apertures, and the apertures having a combined conductancen nwhere C ai are individual aperture conductances; andnusing the latter network model, designing the system to have a desired pressurenuniformity along the elongated direction of the container. |