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filingDate 2002-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af2d2b353ddb9fa361ad3e89024234f2
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publicationDate 2004-01-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-1376672-A1
titleOfInvention Deposition method, deposition apparatus, insulating film and semiconductor integrated circuit
abstract To provide a method and an apparatus for forming a film capable ofnforming a boron-carbon-nitrogen film. n The method for forming the film comprises the steps of generating anplasma 50 in a cylindrical container 1, mainly exciting nitrogen atoms in thencontainer 1, then reacting boron with carbon, and forming the boron-carbon-nitrogennfilm 61 on a substrate 60.
priorityDate 2001-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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