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publicationDate 2003-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-1344843-A2
titleOfInvention Film forming method and substrate
abstract A film forming method comprising: supplying anreactive gas comprising a compound including a metal atomnbetween facing electrodes; arranging a substrate betweennthe electrodes; making the reactive gas in a plasma statenby applying a voltage between the electrodes undernatmospheric, pressure or under a pressure in a vicinity ofnthe atmospheric pressure and discharging; and forming anmetal film on a surface of the substrate by supplying anreducing gas having a reducing property into a plasmanatmosphere in which the reactive gas in the plasma statenexists.
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