| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_950bce8d103dab1bd282965fde47f9f3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-427 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2001-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0363a725abe39bdb9dc4b8d43abb59ef
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_45511bb2c36e951957ab7f8e2c5be69f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_25afac815e0424af8f01925df37077cb |
| publicationDate |
2003-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1344113-A2 |
| titleOfInvention |
Process for removal of photoresist after post ion implantation |
| abstract |
A process for stripping a photoresist layer after exposure to an ion implantation process. The process includes subjecting a substrate having the ion implated photeresist layer thereon to a UV radiation exposure and subsequently removing the ion implated photoresist by conventional stripping processes. |
| priorityDate |
2000-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |