| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e96f3ee1454ffb6578f653ba5b9af958 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6708 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02222
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02343
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31058
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3125
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate |
2002-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d904054332b02568e609a68787ace96f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_00bd99a424413acf0b29fb648a92df73 |
| publicationDate |
2003-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1296358-A2 |
| titleOfInvention |
Process for producing semiconductor substrates |
| abstract |
A process for producing semiconductor substrates withna coating film having an excellent chemical resistance withna high yield and an excellent production reliabilitynwithout any development of cracks and any generation ofnforeign matters due to a projected portion of the coatingnfilm is described, which includes the steps of:n (a) forming a coating film by coating an insulating film-formingncoating liquid on a substrate mounted on a rotatingndisc of a spin coater according to a spin coating method;nand then (b) removing a projected portion of the coating film formednat the periphery of the substrate by ejecting a solventnthrough a nozzle moving from any point on a line drawnnbetween the periphery edge and the center of the substratentoward the periphery edge while rotating the substrate. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006071363-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-100587607-C
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1827712-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1827712-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007135556-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8408222-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/NL-1032067-C2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7838206-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7691559-B2 |
| priorityDate |
2001-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |