http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1190435-A1

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filingDate 2000-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b582443ca84662137b079e090997bf89
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publicationDate 2002-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-1190435-A1
titleOfInvention A plasma reaction chamber component having improved temperature uniformity
abstract A component useful for a plasma reaction chamber includes a heat sink such as a temperature-controlled support member (22) and a heated member such as an electrically powered showerhead electrode (20). The showerhead electrode is peripherally secured to the support member to enclose a gas distribution chamber between a top surface (30) of the electrode and a bottom surface (32) of the support member. A heat transfer member (36) extends between the electrode and the support member and transfers heat from an area of highest temperature buildup on the top surface of the showerhead electrode to the bottom surface of the support member in order to control the temperature distribution across the showerhead electrode.
priorityDate 1999-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 26.