| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_49c7c7d947f4481d87620430416a22b3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bb5143c5d291d49c700ac1631bdd20df |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24355
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2204-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2201-21
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2203-42 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32559
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32477
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C3-06 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-687
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate |
2001-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96a9861f4ab6149941f4b5b773fb4758
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4bba352a30d3bafbb22f519721a23c86
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_193ac59a84d5231bb694e6822f1c4d71 |
| publicationDate |
2002-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1187170-A3 |
| titleOfInvention |
Plasma resistant quartz glass jig |
| abstract |
It is an object of the present invention to provide a quartz glass jig excellent in thenplasma etching resistant characteristics, which does not generate an abnormal etchingnand particles when used for a plasma generating apparatus. n The above Object is obtained by a plasma resistant quartz glass jig that is used for annapparatus of generating plasma, wherein the surface roughness Ra of the quartz glassnsurface is in a range of from 5 µm to 0.05 µm, the number of microcracks of the surfacenis not more than 500 microcracks/cm 2 , and the hydrogen molecule concentration in thenquartz glass is at least 5 × 10 16 molecules/cm 3 . |
| priorityDate |
2000-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |