| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32706
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00 |
| filingDate |
1999-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_03bd1fe7feec95c23e8c70af52a846d0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a8ac9f84048e798d290a9259a9a4e233 |
| publicationDate |
2001-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1143496-A1 |
| titleOfInvention |
Plasma etching method |
| abstract |
A wafer W is placed on a lower electrode 106 provided inside anprocessing chamber 102 of an etching apparatus 100 and a gasncontaining C4F8 is induced into the processing chamber 102. Ancontroller 112 implements control to apply 27MHz power to an uppernelectrode 114 from a plasma generating power supply 120 and tonintermittently apply 800KHz power to the lower electrode 106 from anbiasing power supply 108. While the biasing power is on, anninsulating film 202 constituted of SiO2 at the wafer W is etched,nwhereas a polymer (protective film) 208 is formed at a photoresist filmn206 while the biasing power is off. Adopting the above method,ncontact holes achieving a specific shape can be formed by improvingnthe selectivity of the insulating film relative to the photoresist film. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0237549-A3 |
| priorityDate |
1998-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |