| abstract |
The polishing slurry includes polishing particlesnhaving a mean particle diameter of less than aboutn5µm. The slurry contains at least about 0.5 totalnweight percent oxidizer selected from at least one ofnthe group consisting of HNO 3 , Ni(NO 3 ) 2 , Al(NO 3 ) 3 ,nMg(NO 3 ) 2 , Zn(NO 3 ) 2 and NH 4 NO 3 . A small but effectivenamount of a co-oxidizer selected from the groupnconsisting of perbromates, perchlorates, periodates,npersulfates, permanganates, ferric nitrate, cerium-containingnsalts, perbenzoic acids, nitrite compounds,nperborate compounds, hypochlorite compounds, chloritencompounds and chloride compounds accelerates removal ofnsubstrates; and water forms the balance of the aqueousnslurry. |