| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5c29fcc7ccfc975868da7f2afb93346d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0809
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00162
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0841
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0869
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00058
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0112
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0871
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0894 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30621
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B7-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-2445
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32135
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J12-007
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30655
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C17-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00619
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C17-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B7-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J12-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C1-00 |
| filingDate |
1999-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2007-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d97f19230d671c7bb1de2d5c76a77ee |
| publicationDate |
2007-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1099244-B1 |
| titleOfInvention |
Method for anisotropic etching |
| abstract |
There is disclosed a method of treating a substrate material or a film present on the material surface comprising cyclically performing the following steps: (a) etching the material or film; (b) depositing or forming a passivation layer on the surfaces of an etched feature; and (c) selectively removing the passivation layer from the etched feature in order that the etching proceeds in a direction substantially perpendicular to the material or film surface. At least one of the steps (a) or (b) is performed in the absence of a plasma. Also disclosed is an apparatus for performing the method. |
| priorityDate |
1998-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |