abstract |
A resist composition contains as a base resin anpolymer comprising recurring units of the formula (1-1) orn(1-2) and having a Mw of 1,000-500,000.n nR 1 is H, methyl or CO 2 R 2 , R 2 is a straight, branched or cyclicnC 1-15 alkyl group, R 3 is hydrogen, methyl or CH 2 CO 2 R 2 , R 4 is annacid labile group, i is an integer of 1 to 4, and k is equalnto 0 or 1. The resist composition has significantlynimproved sensitivity, resolution and etching resistance andnis very useful in precise microfabrication. |