http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1094505-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32229 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32192 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32284 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 |
| filingDate | 1997-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_65e78fc0aa2de2a72fa17a5da3a592a5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_73a8d4848dfae6c21c3ea69509a88287 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_635dcd00964e8c25a799952a88287e39 |
| publicationDate | 2001-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-1094505-A1 |
| titleOfInvention | Plasma treating device |
| abstract | The invention is intended to produce a plasma of uniformndensity in a wide region and to achieve plasma processing ofna surface of a wafer (W) highly uniformly. A transmissionnwindow (23) which transmits a microwave is held on an uppernwall of a vacuum vessel (2) having a plasma chamber (21) andna film forming chamber (22), and a waveguide (4) for guidingnthe microwave of 2.45 GHz for propagation into the vacuum vesseln(2) in a TM mode is joined to the outer surface of thentransmission window (23). The waveguide (4) has a rectangularnwaveguide section (41) a cylindrical waveguide section (42)nserving as a TM converter, and a conical waveguide section (43)nhaving an exit end connected to the outer surface of thentransmission window (23). The microwave is propagated in anTM mode into the vacuum vessel (2) and a magnetic field isncreated in the vacuum vessel (2). A plasma can be formed innuniform density in the plasma chamber (21) if the insidendiameter (A) of the exit end of the conical waveguide sectionnis in the range of 130 to 160 mm, so that the highly uniformnplasma processing of the surface of a wafer (W) of, for example,n8 in. in diameter can be achieved. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2005104174-A1 |
| priorityDate | 1996-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID90455 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559503 |
Total number of triples: 23.