Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_260220c525b214105ee48ee2d77a5bf4 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02C20-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P70-50 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 |
filingDate |
1998-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8bd87ac3b94c93c44a6222bcfd6fce03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_09ada45b8235a0eb7704427d6c02affd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e6d17530bac3d3dbd9b293cb8dfef39c |
publicationDate |
2000-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-1042799-A1 |
titleOfInvention |
Hydrofluorocarbon etching compounds with reduced global warming impact |
abstract |
A method of etching comprising subjecting a material under plasma etching conditions to an etching composition comprising at least an etchant compound having the formula: CxHyFz wherein: x = 3, 4 or 5; 2x≥z≥y; and y+z=2x+2; and further including an etching composition which includes said etchant compound and a second material different from the etchant compound that enhances or modifies plasma etching. |
priorityDate |
1997-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |