http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1029341-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8381805eba6d034fc77bd230dd02e6e2 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32935 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-73 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-73 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate | 1998-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4bb9c8ad1710271dea75c3ce0342c3a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b9e9a3f7f90a3ad568029d79ded01ed8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d870977ac2852834bba588d0010c1f5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_703d2904bc3602507e90d2d063f6ad80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b70e2e58b6ea9c4bd1de55de80f21b47 |
| publicationDate | 2000-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-1029341-A1 |
| titleOfInvention | Monitor of plasma processes with multivariate statistical analysis of plasma emission spectra |
| abstract | Plasma process analysis techniques are provided. The intensity of each of a number, P, of a plurality of radiation wavelengths that are emitted from a plasma process are monitored as the process proceeds. Indications of P-dimensional correlations between the intensities of the P monitored wavelengths are produced as the process proceeds. Then the produced correlation indications are compared with a prespecified correlation indication generated based on historical conditions for the plasma process, to determine the status condition of the process as the process proceeds. With this technique, the use of a priori, expected, specific templates is not required for evaluating radiation emission data during a plasma process. Instead the techniques investigate and discover the multiple complex correlations that form between various radiation emission wavelengths during a plasma process, and do not impose an expectation for a specific correlation or trend between the various wavelengths. The discovered correlations found to exist between the radiation wavelengths are then employed for monitoring a plasma process based on the discovered correlations. The analysis techniques enable evaluation of interactions occurring across the entire spectrum of detected radiation emission wavelengths, and thus can accomplish detection and analysis of changes in a given plasma process due to shifts in the electrical and physical process environment as well as changes in a given process due to procession through stages of the process. |
| priorityDate | 1997-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426098978 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6327212 |
Total number of triples: 22.