| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36f8253f3d0d59bcd9259217d4385d10 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02071
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32139
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-18 |
| filingDate |
1999-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2007-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_61e4db521b6568c51749e8c5299c85e4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30a413dbea490e25e321707ef9b29a17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f3dfbaf5e516d43dc9235c43cf594047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b275e6d3eec529231678cd98f26f90cd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_181567d632c639356f08e8f5fc08acb3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78a3ac3bd5d1fc0cfe6a6b72458e4540 |
| publicationDate |
2007-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0987745-B1 |
| titleOfInvention |
Metallization etching method using a hard mask layer |
| priorityDate |
1998-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |