| abstract |
An inactive gas is introduced into an organic materialnevaporation source to place a thin organic film material in thenorganic material evaporation source in an atmosphere having anrelatively high pressure, and the temperature of the thin organicnfilm material is increased up to a certain temperature. Then, thenorganic material evaporation source is evacuated to lower thenpressure around the thin organic film material for thereby causingnthe thin organic film material to emit a vapor. Since no wastefulnvapor is emitted from the thin organic film material, the thin organicnfilm material is effectively utilized. Because the inactive gas actsnas a heating medium, the temperature of the thin organic film materialnis increased at a high rate, and the thin organic film material isnuniformly heated. When the temperature of the thin organic filmnmaterial is lowered in an inactive gas atmosphere, it can be lowerednat a high rate. The inactive gas is introduced directly into thenorganic material evaporation source by an on-off valve, the timenrequired to evacuate the organic material evaporation source isnreduced. A liquid thin organic film material may be heated by anheating medium in the organic material evaporation source, so thatnthe liquid thin organic film material will not be heated to antemperature higher than the temperature of the heating medium, andnhence will not suffer bumping due to a temperature overshooting. |