| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f481982f9992cbb527a6d31589832958 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 |
| filingDate |
1999-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f32a68a31ee83dc63b323bdfd0d36c4a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a43b6d31988ccdd57711947714ca6907
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52f4da7d1a75b5c20de084d050a6d1ac
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5a826687a63e48bc0f1cc95684a8877e |
| publicationDate |
1999-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0940844-A2 |
| titleOfInvention |
Integrated circuit fabrication |
| abstract |
The quartz shadow ring (e.g., 131) of a conventional plasma etchingnapparatus is desirably coated with material which inhibits the liberation of oxygen intonthe plasma. Investigation has shown that the liberated oxygen degrades etchingnuniformity across the wafer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2405475-A1 |
| priorityDate |
1998-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |