| abstract |
A composition for a bottom anti-reflective coatingnmaterial and a method for forming a resist pattern using thencomposition, which are high in the dry etching rate, high innthe resolution, excellent in the resist film thicknessndependency and high in the effect of preventing reflectivenlight against exposure light, and provide no intermixing withnthe photoresist layer, are disclosed, wherein the compositionnfor a bottom anti-reflective coating material comprises annaphthalene group-containing polymer compound having anspecific structure. |