Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fdad00677b9268c26e005a9e03a7b9dd http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4ddcb273a108a5d8472b335280098e06 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32137 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L49-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
filingDate |
1997-05-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bafb2807656f3a71a1bdb2be0b77fcf3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6faa82f31cd37dd161ecde35584eea16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_236da51632a752b59470c042be25eb84 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6794bd273244b82984283cd2dd34ed21 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_43669968d17a10500a6099e9242a5531 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d93d1134780afb0ec824ad9683ee78a1 |
publicationDate |
1997-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-0807968-A2 |
titleOfInvention |
Etching a metal silicide with HC1 and chlorine |
abstract |
Metal silicide is removed at a faster rate than polysilicon in dry etching of metal silicide/polysilicon composites with an etching gas made from HCl and Cl 2 at a volumetric flowrate ratio of HCl:Cl 2 within the range of 3:1 to 5:1. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1195802-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0229880-A1 |
priorityDate |
1996-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |