| abstract |
This invention is aimed at providing a photosensitive resin, a photosensitive resin composition, and a method for pattern-formation by which the excellent properties of water-resistance and heat-resistance, and sufficient water-solubility, and an excellent compatibility to an anionic additive can be attained. According to the invention, a photosensitive resin is provided as a polyvinyl alcohol base polymer compound obtained by suspending a styryl compound (I) having a nitrogen heterocyclic ring with a quaternary aromatic species and a phenyl compound (II) having two sulfone groups, in which the content of (1) is 0.5 to 10 mole % while the content of (II) is 0.1 to 20 mole %. |