http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0704891-A1

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filingDate 1995-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59a676affa3903df1bbd409b33b0373e
publicationDate 1996-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0704891-A1
titleOfInvention Quartz glass jig for heat-treating semiconductor wafers and method for producing same
abstract A reaction tube 10 without occurrence of crack or breakdown or a wafer boat 20 without generation of particles is provided, such various faults being caused by the difference between the thermal expansion coefficients of a thin film and one of those quartz glass jigs. n The present invention is applied to a quartz glass jig used in a thermal CVD apparatus, and is characterized in that the jig is made of transparent quartz glass material, and that the portion or portions exposed to the heat treatment space or the portions contacting with wafers 30 are sand-blasted. n The reason why transparent quartz glass is limited as the material is that, in case of transparent quartz glass, the surface hardness is more uniform in comparison to bubble-mixed or opaque quartz glass and thus a predetermined surface roughness is more effectively achieved by sand-blasting, so that the faults as mentioned above due to the stress occurring in the treatment between a CVD film and one of the quartz glass jigs are effectively prevented.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0032529-A1
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priorityDate 1994-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 31.